# Characterization of low dielectric constant plasma enhanced chemical vapor deposition fluorinated silicon oxide films as intermetal dielectric materials

**Type:** Papers  
**Canonical URL:** https://scholariq.org/papers/characterization-of-low-dielectric-constant-plasma-enhanced-chemical-vapor/

## Facts

| Field | Value |
| --- | --- |
| Author Names | Kwangtaek Kim,Dae‐Hyuk Kwon,G. Nallapati,G. S. Lee |
| Citations | 25 |
| DOI | 10.1116/1.581178 |
| Fields | Engineering,Materials Science |
| Open Access | false |
| OA Status | closed |
| OpenAlex ID | https://openalex.org/W2109097284 |
| Type | article |
| Year | 1998 |

## Paper authors

- [Kwangtaek Kim](https://scholariq.org/researchers/kwangtaek-kim/)

## Paper primary topic

- [Copper Interconnects and Reliability](https://scholariq.org/topics/copper-interconnects-and-reliability/)

## Paper topics

- [Copper Interconnects and Reliability](https://scholariq.org/topics/copper-interconnects-and-reliability/)
- [Semiconductor materials and devices](https://scholariq.org/topics/semiconductor-materials-and-devices/)
- [Advanced ceramic materials synthesis](https://scholariq.org/topics/advanced-ceramic-materials-synthesis/)

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Source: ScholarIQ — public research metadata, principally OpenAlex. See https://scholariq.org/sources/ for provenance and https://scholariq.org/methodology/ for what these figures mean.