# Controlled chemical etching leads to efficient silicon–bismuth interface for photoelectrochemical CO2 reduction to formate

**Type:** Papers  
**Canonical URL:** https://scholariq.org/papers/controlled-chemical-etching-leads-to-efficient-silicon-bismuth-interface-for/

## Facts

| Field | Value |
| --- | --- |
| Author Names | Pan Ding,Yiqi Hu,Jun Deng,J. Chen,Chenyang Zha,Hui Yang,N. Han,Qiufang Gong,L. Li,T. Wang,Xiaodong Zhao,Yanguang Li |
| Citations | 41 |
| DOI | 10.1016/j.mtchem.2018.10.009 |
| Fields | Energy,Materials Science |
| Open Access | false |
| OA Status | closed |
| OpenAlex ID | https://openalex.org/W2901519098 |
| Type | article |
| Year | 2018 |

## Paper authors

- [N. Han](https://scholariq.org/researchers/n-han/)

## Paper primary topic

- [CO2 Reduction Techniques and Catalysts](https://scholariq.org/topics/co2-reduction-techniques-and-catalysts/)

## Paper topics

- [CO2 Reduction Techniques and Catalysts](https://scholariq.org/topics/co2-reduction-techniques-and-catalysts/)
- [Advanced Photocatalysis Techniques](https://scholariq.org/topics/advanced-photocatalysis-techniques/)
- [Electronic and Structural Properties of Oxides](https://scholariq.org/topics/electronic-and-structural-properties-of-oxides/)

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