# Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process

**Type:** Papers  
**Canonical URL:** https://scholariq.org/papers/dual-frequency-superimposed-rf-capacitive-coupled-plasma-etch-process/

## Facts

| Field | Value |
| --- | --- |
| Author Names | Akihiro Kojima,Hisataka Hayashi,Itsuko Sakai,Junya Nishiwaki,Akihiro Takase,M. Ohmura,T. Matsushita,Eiichiro Shinomiya,Tokuhisa Ohiwa,Jun Yashiro,Shinji Himori,Kazuya Nagaseki |
| Citations | 15 |
| DOI | 10.1143/jjap.44.6241 |
| Fields | Engineering,Materials Science |
| Open Access | true |
| OA Status | bronze |
| OA URL | https://iopscience.iop.org/article/10.1143/JJAP.44.6241/pdf |
| OpenAlex ID | https://openalex.org/W1998949575 |
| Type | article |
| Year | 2005 |

## Paper authors

- [T. Matsushita](https://scholariq.org/researchers/t-matsushita/)

## Paper primary topic

- [Semiconductor materials and devices](https://scholariq.org/topics/semiconductor-materials-and-devices/)

## Paper topics

- [Semiconductor materials and devices](https://scholariq.org/topics/semiconductor-materials-and-devices/)
- [Copper Interconnects and Reliability](https://scholariq.org/topics/copper-interconnects-and-reliability/)
- [Advanced Surface Polishing Techniques](https://scholariq.org/topics/advanced-surface-polishing-techniques/)

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Source: ScholarIQ — public research metadata, principally OpenAlex. See https://scholariq.org/sources/ for provenance and https://scholariq.org/methodology/ for what these figures mean.