# Influence of positive bias stress on N2O plasma improved InGaZnO thin film transistor

**Type:** Papers  
**Canonical URL:** https://scholariq.org/papers/influence-of-positive-bias-stress-on-n2o-plasma-improved-ingazno-thin-film/

## Facts

| Field | Value |
| --- | --- |
| Author Names | Chih-Tsung Tsai,Ting‐Chang Chang,Shih-Ching Chen,Ikai Lo,Shu-Wei Tsao,Ming‐Chin Hung,Jiun‐Jye Chang,Chen-Yi Wu,Chun‐Yao Huang |
| Citations | 171 |
| DOI | 10.1063/1.3453870 |
| Fields | Engineering,Materials Science |
| Open Access | false |
| OA Status | closed |
| OpenAlex ID | https://openalex.org/W2076285904 |
| Type | article |
| Year | 2010 |

## Paper authors

- [Shih-Ching Chen](https://scholariq.org/researchers/shih-ching-chen/)

## Paper primary topic

- [Thin-Film Transistor Technologies](https://scholariq.org/topics/thin-film-transistor-technologies/)

## Paper topics

- [Thin-Film Transistor Technologies](https://scholariq.org/topics/thin-film-transistor-technologies/)
- [ZnO doping and properties](https://scholariq.org/topics/zno-doping-and-properties/)
- [Semiconductor materials and devices](https://scholariq.org/topics/semiconductor-materials-and-devices/)

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Source: ScholarIQ — public research metadata, principally OpenAlex. See https://scholariq.org/sources/ for provenance and https://scholariq.org/methodology/ for what these figures mean.