# Optimization of optical proximity correction to reduce mask write time using genetic algorithm

**Type:** Papers  
**Canonical URL:** https://scholariq.org/papers/optimization-of-optical-proximity-correction-to-reduce-mask-write-time-using/

## Facts

| Field | Value |
| --- | --- |
| Author Names | Gregory J. Dick,Abhishek Asthana,Liang Cao,Jing Cheng,David Power |
| Citations | 1 |
| DOI | 10.1117/12.2297400 |
| Fields | Engineering |
| Open Access | false |
| OA Status | closed |
| OpenAlex ID | https://openalex.org/W2791064627 |
| Type | erratum |
| Year | 2018 |

## Paper authors

- [David Power](https://scholariq.org/researchers/david-power/)

## Paper primary topic

- [Advancements in Photolithography Techniques](https://scholariq.org/topics/advancements-in-photolithography-techniques/)

## Paper topics

- [Advancements in Photolithography Techniques](https://scholariq.org/topics/advancements-in-photolithography-techniques/)
- [Industrial Vision Systems and Defect Detection](https://scholariq.org/topics/industrial-vision-systems-and-defect-detection/)
- [Advanced Surface Polishing Techniques](https://scholariq.org/topics/advanced-surface-polishing-techniques/)

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Source: ScholarIQ — public research metadata, principally OpenAlex. See https://scholariq.org/sources/ for provenance and https://scholariq.org/methodology/ for what these figures mean.