# Reduction of pattern peeling in step-and-flash imprint lithography

**Type:** Papers  
**Canonical URL:** https://scholariq.org/papers/reduction-of-pattern-peeling-in-step-and-flash-imprint-lithography/

## Facts

| Field | Value |
| --- | --- |
| Author Names | Satoshi Takei,Tsuyoshi Ogawa,Ryan Deschner,C. Grant Willson |
| Citations | 28 |
| DOI | 10.1016/j.mee.2013.10.010 |
| Fields | Engineering,Physics and Astronomy |
| Open Access | false |
| OA Status | closed |
| OpenAlex ID | https://openalex.org/W1971250122 |
| Type | article |
| Year | 2013 |

## Paper authors

- [Tsuyoshi Ogawa](https://scholariq.org/researchers/tsuyoshi-ogawa/)

## Paper primary topic

- [Nanofabrication and Lithography Techniques](https://scholariq.org/topics/nanofabrication-and-lithography-techniques/)

## Paper topics

- [Nanofabrication and Lithography Techniques](https://scholariq.org/topics/nanofabrication-and-lithography-techniques/)
- [Advancements in Photolithography Techniques](https://scholariq.org/topics/advancements-in-photolithography-techniques/)
- [Force Microscopy Techniques and Applications](https://scholariq.org/topics/force-microscopy-techniques-and-applications/)

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Source: ScholarIQ — public research metadata, principally OpenAlex. See https://scholariq.org/sources/ for provenance and https://scholariq.org/methodology/ for what these figures mean.