# Silicon-Containing Spin-on Underlayer Material for Step and Flash Nanoimprint Lithography

**Type:** Papers  
**Canonical URL:** https://scholariq.org/papers/silicon-containing-spin-on-underlayer-material-for-step-and-flash-nanoimprint/

## Facts

| Field | Value |
| --- | --- |
| Author Names | Satoshi Takei,Tsuyoshi Ogawa,Ryan Deschner,Kane Jen,Takayasu Nihira,Makoto Hanabata,C. Grant Willson |
| Citations | 34 |
| DOI | 10.1143/jjap.49.075201 |
| Fields | Engineering |
| Open Access | true |
| OA Status | bronze |
| OA URL | https://iopscience.iop.org/article/10.1143/JJAP.49.075201/pdf |
| OpenAlex ID | https://openalex.org/W2063327483 |
| Type | article |
| Year | 2010 |

## Paper authors

- [Tsuyoshi Ogawa](https://scholariq.org/researchers/tsuyoshi-ogawa/)

## Paper primary topic

- [Nanofabrication and Lithography Techniques](https://scholariq.org/topics/nanofabrication-and-lithography-techniques/)

## Paper topics

- [Nanofabrication and Lithography Techniques](https://scholariq.org/topics/nanofabrication-and-lithography-techniques/)
- [Advancements in Photolithography Techniques](https://scholariq.org/topics/advancements-in-photolithography-techniques/)
- [Advanced Surface Polishing Techniques](https://scholariq.org/topics/advanced-surface-polishing-techniques/)

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Source: ScholarIQ — public research metadata, principally OpenAlex. See https://scholariq.org/sources/ for provenance and https://scholariq.org/methodology/ for what these figures mean.