# Study of electrical and microstructure properties of high dielectric hafnium oxide thin film for MOS devices

**Type:** Papers  
**Canonical URL:** https://scholariq.org/papers/study-of-electrical-and-microstructure-properties-of-high-dielectric-hafnium/

## Facts

| Field | Value |
| --- | --- |
| Author Names | R.K. Nahar,Vikram Singh,Aparna Sharma |
| Citations | 79 |
| DOI | 10.1007/s10854-006-9111-6 |
| Fields | Engineering |
| Open Access | false |
| OA Status | closed |
| OpenAlex ID | https://openalex.org/W2017856052 |
| Type | article |
| Year | 2007 |

## Paper authors

- [Aparna Sharma](https://scholariq.org/researchers/aparna-sharma/)

## Paper primary topic

- [Semiconductor materials and devices](https://scholariq.org/topics/semiconductor-materials-and-devices/)

## Paper topics

- [Semiconductor materials and devices](https://scholariq.org/topics/semiconductor-materials-and-devices/)
- [Advancements in Semiconductor Devices and Circuit Design](https://scholariq.org/topics/advancements-in-semiconductor-devices-and-circuit-design/)
- [Integrated Circuits and Semiconductor Failure Analysis](https://scholariq.org/topics/integrated-circuits-and-semiconductor-failure-analysis/)

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Source: ScholarIQ — public research metadata, principally OpenAlex. See https://scholariq.org/sources/ for provenance and https://scholariq.org/methodology/ for what these figures mean.