# Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)

**Type:** Papers  
**Canonical URL:** https://scholariq.org/papers/sub-10-nm-electron-beam-lithography-using-cold-development-of-poly/

## Facts

| Field | Value |
| --- | --- |
| Author Names | Walter Hu,K. Sarveswaran,Marya Lieberman,Gary H. Bernstein |
| Citations | 240 |
| DOI | 10.1116/1.1763897 |
| Fields | Engineering |
| Open Access | false |
| OA Status | closed |
| OpenAlex ID | https://openalex.org/W1974207245 |
| Type | article |
| Year | 2004 |

## Paper authors

- [Walter Hu](https://scholariq.org/researchers/walter-hu/)

## Paper primary topic

- [Semiconductor materials and devices](https://scholariq.org/topics/semiconductor-materials-and-devices/)

## Paper topics

- [Semiconductor materials and devices](https://scholariq.org/topics/semiconductor-materials-and-devices/)
- [Advancements in Photolithography Techniques](https://scholariq.org/topics/advancements-in-photolithography-techniques/)
- [Integrated Circuits and Semiconductor Failure Analysis](https://scholariq.org/topics/integrated-circuits-and-semiconductor-failure-analysis/)

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Source: ScholarIQ — public research metadata, principally OpenAlex. See https://scholariq.org/sources/ for provenance and https://scholariq.org/methodology/ for what these figures mean.