# Ultraviolet curable branched siloxanes as low-k dielectrics for imprint lithography

**Type:** Papers  
**Canonical URL:** https://scholariq.org/papers/ultraviolet-curable-branched-siloxanes-as-low-k-dielectrics-for-imprint/

## Facts

| Field | Value |
| --- | --- |
| Author Names | Tsuyoshi Ogawa,Satoshi Takei,C. Grant Willson |
| Citations | 16 |
| DOI | 10.1116/1.4770051 |
| Fields | Engineering |
| Open Access | false |
| OA Status | closed |
| OpenAlex ID | https://openalex.org/W2164433024 |
| Type | article |
| Year | 2012 |

## Paper authors

- [Tsuyoshi Ogawa](https://scholariq.org/researchers/tsuyoshi-ogawa/)

## Paper primary topic

- [Nanofabrication and Lithography Techniques](https://scholariq.org/topics/nanofabrication-and-lithography-techniques/)

## Paper topics

- [Nanofabrication and Lithography Techniques](https://scholariq.org/topics/nanofabrication-and-lithography-techniques/)
- [Advancements in Photolithography Techniques](https://scholariq.org/topics/advancements-in-photolithography-techniques/)
- [Advanced Surface Polishing Techniques](https://scholariq.org/topics/advanced-surface-polishing-techniques/)

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Source: ScholarIQ — public research metadata, principally OpenAlex. See https://scholariq.org/sources/ for provenance and https://scholariq.org/methodology/ for what these figures mean.