# Advanced Surface Polishing Techniques

**Type:** Topics  
**Canonical URL:** https://scholariq.org/topics/advanced-surface-polishing-techniques-2/

## Facts

| Field | Value |
| --- | --- |
| Citations | 575,410 |
| Description | This cluster of papers focuses on the techniques, mechanisms, and simulations related to chemical mechanical polishing (CMP) in the context of microelectronics manufacturing. It covers topics such as material removal mechanisms, molecular dynamics simulation, ultra-precision grinding, surface and subsurface damage, nanometric cutting, magnetorheological finishing, polishing slurry chemistry, and tool wear. |
| Domain | Physical Sciences |
| Field | Engineering |
| OpenAlex ID | https://openalex.org/T11301 |
| Works | 81,790 |

## Topic researchers

Showing 12 of 20.

- [George M. Whitesides](https://scholariq.org/researchers/george-m-whitesides/)
- [Jens K. Nørskov](https://scholariq.org/researchers/jens-k-n-rskov/)
- [Younan Xia](https://scholariq.org/researchers/younan-xia/)
- [Akira Fujishima](https://scholariq.org/researchers/akira-fujishima/)
- [Dierk Raabe](https://scholariq.org/researchers/dierk-raabe/)
- [L. Ju](https://scholariq.org/researchers/l-ju/)
- [M. Mohammadi Najafabadi](https://scholariq.org/researchers/m-mohammadi-najafabadi/)
- [P. Petkov](https://scholariq.org/researchers/p-petkov/)
- [L. Gonella](https://scholariq.org/researchers/l-gonella/)
- [B. Pavlov](https://scholariq.org/researchers/b-pavlov/)
- [H. Nogima](https://scholariq.org/researchers/h-nogima/)
- [M. Menichelli](https://scholariq.org/researchers/m-menichelli/)

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Source: ScholarIQ — public research metadata, principally OpenAlex. See https://scholariq.org/sources/ for provenance and https://scholariq.org/methodology/ for what these figures mean.