# Advancements in Photolithography Techniques

**Type:** Topics  
**Canonical URL:** https://scholariq.org/topics/advancements-in-photolithography-techniques-2/

## Facts

| Field | Value |
| --- | --- |
| Citations | 296,942 |
| Description | This cluster of papers focuses on electron beam lithography, nanofabrication, and resolution limits in lithography techniques. It explores the applications of extreme ultraviolet lithography, chemically amplified resists, and high-resolution patterning materials. The cluster also discusses the challenges related to line edge roughness and mask design in nanolithography. |
| Domain | Physical Sciences |
| Field | Engineering |
| OpenAlex ID | https://openalex.org/T11338 |
| Works | 49,665 |

## Topic researchers

Showing 12 of 20.

- [George M. Whitesides](https://scholariq.org/researchers/george-m-whitesides/)
- [Younan Xia](https://scholariq.org/researchers/younan-xia/)
- [Hua Zhang](https://scholariq.org/researchers/hua-zhang-2/)
- [Chad A. Mirkin](https://scholariq.org/researchers/chad-a-mirkin/)
- [Joseph Wang](https://scholariq.org/researchers/joseph-wang/)
- [Randy J. Read](https://scholariq.org/researchers/randy-j-read/)
- [R. Klanner](https://scholariq.org/researchers/r-klanner/)
- [Emmanuel J. Candès](https://scholariq.org/researchers/emmanuel-j-candes/)
- [M. Bluj](https://scholariq.org/researchers/m-bluj/)
- [Yonggang Huang](https://scholariq.org/researchers/yonggang-huang/)
- [Michael J. Frisch](https://scholariq.org/researchers/michael-j-frisch/)
- [Phaedon Avouris](https://scholariq.org/researchers/phaedon-avouris/)

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Source: ScholarIQ — public research metadata, principally OpenAlex. See https://scholariq.org/sources/ for provenance and https://scholariq.org/methodology/ for what these figures mean.