# Advancements in Photolithography Techniques

**Type:** Topics  
**Canonical URL:** https://scholariq.org/topics/advancements-in-photolithography-techniques/

## Facts

| Field | Value |
| --- | --- |
| Description | This cluster of papers focuses on electron beam lithography, nanofabrication, and resolution limits in lithography techniques. It explores the applications of extreme ultraviolet lithography, chemically amplified resists, and high-resolution patterning materials. The cluster also discusses the challenges related to line edge roughness and mask design in nanolithography. |
| Domain | Physical Sciences |
| Field | Engineering |
| OpenAlex ID | t11338 |
| Works | 15 |

## Topic papers all

- [Convolutional Neural Network for Wafer Surface Defect Classification and the Detection of Unknown Defect Class](https://scholariq.org/papers/convolutional-neural-network-for-wafer-surface-defect-classification-and-the/)
- [Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)](https://scholariq.org/papers/sub-10-nm-electron-beam-lithography-using-cold-development-of-poly/)
- [Constraint-based watermarking techniques for design IP protection](https://scholariq.org/papers/constraint-based-watermarking-techniques-for-design-ip-protection/)
- [EUV lithography performance for manufacturing: status and outlook](https://scholariq.org/papers/euv-lithography-performance-for-manufacturing-status-and-outlook/)
- [Molecular dynamics study on the effects of stamp shape, adhesive energy, and temperature on the nanoimprint lithography process](https://scholariq.org/papers/molecular-dynamics-study-on-the-effects-of-stamp-shape-adhesive-energy-and/)
- [EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update](https://scholariq.org/papers/euv-for-hvm-towards-an-industrialized-scanner-for-hvm-nxe3400b-performance/)
- [Silicon-Containing Spin-on Underlayer Material for Step and Flash Nanoimprint Lithography](https://scholariq.org/papers/silicon-containing-spin-on-underlayer-material-for-step-and-flash-nanoimprint/)
- [Reduction of pattern peeling in step-and-flash imprint lithography](https://scholariq.org/papers/reduction-of-pattern-peeling-in-step-and-flash-imprint-lithography/)
- [Deep learning-based detection, classification, and localization of defects in semiconductor processes](https://scholariq.org/papers/deep-learning-based-detection-classification-and-localization-of-defects-in/)
- [Ultraviolet curable branched siloxanes as low-k dielectrics for imprint lithography](https://scholariq.org/papers/ultraviolet-curable-branched-siloxanes-as-low-k-dielectrics-for-imprint/)
- [OFETs with sub-100nm channel length fabricated by wafer-scale NIL and comprehensive DC and AC characterizations](https://scholariq.org/papers/ofets-with-sub-100nm-channel-length-fabricated-by-wafer-scale-nil-and/)
- [Dry etch challenges for CD shrinkage in memory process](https://scholariq.org/papers/dry-etch-challenges-for-cd-shrinkage-in-memory-process/)
- [Wafer Defect Identification with Optimal Hyper-Parameter Tuning of Support Vector Machine using the Deep Feature of ResNet 101](https://scholariq.org/papers/wafer-defect-identification-with-optimal-hyper-parameter-tuning-of-support/)
- [Measurement of Plating Thickness with High Liftoff Using Eddy Current Testing](https://scholariq.org/papers/measurement-of-plating-thickness-with-high-liftoff-using-eddy-current-testing/)
- [Optimization of optical proximity correction to reduce mask write time using genetic algorithm](https://scholariq.org/papers/optimization-of-optical-proximity-correction-to-reduce-mask-write-time-using/)

## Topic primary papers

- [EUV lithography performance for manufacturing: status and outlook](https://scholariq.org/papers/euv-lithography-performance-for-manufacturing-status-and-outlook/)
- [EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update](https://scholariq.org/papers/euv-for-hvm-towards-an-industrialized-scanner-for-hvm-nxe3400b-performance/)
- [Optimization of optical proximity correction to reduce mask write time using genetic algorithm](https://scholariq.org/papers/optimization-of-optical-proximity-correction-to-reduce-mask-write-time-using/)

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Source: ScholarIQ — public research metadata, principally OpenAlex. See https://scholariq.org/sources/ for provenance and https://scholariq.org/methodology/ for what these figures mean.