# Semiconductor materials and devices
**Type:** Topics
**Canonical URL:** https://scholariq.org/topics/semiconductor-materials-and-devices/
## Facts
| Field | Value |
| --- | --- |
| Description | This cluster of papers focuses on the advances in atomic layer deposition (ALD) technology, particularly in the context of high-k dielectrics, gate oxides, and semiconductor devices. It covers topics such as thin film growth, dielectric breakdown mechanisms, metal gate transistors, interface engineering, and the impact of negative bias temperature instability (NBTI) degradation on device performance. |
| Domain | Physical Sciences |
| Field | Engineering |
| OpenAlex ID | t10472 |
| Works | 79 |
## Topic papers all
Showing 15 of 79.
- [230% room-temperature magnetoresistance in CoFeB∕MgO∕CoFeB magnetic tunnel junctions](https://scholariq.org/papers/230-room-temperature-magnetoresistance-in-cofeb-mgo-cofeb-magnetic-tunnel/)
- [Fe Stabilization by Intermetallic L10-FePt and Pt Catalysis Enhancement in L10-FePt/Pt Nanoparticles for Efficient Oxygen Reduction Reaction in Fuel Cells](https://scholariq.org/papers/fe-stabilization-by-intermetallic-l1-sub-0-sub-fept-and-pt-catalysis-enhancement/)
- [Pinpoint and bulk electrochemical reduction of insulating silicon dioxide to silicon](https://scholariq.org/papers/pinpoint-and-bulk-electrochemical-reduction-of-insulating-silicon-dioxide-to/)
- [Wake-up effects in Si-doped hafnium oxide ferroelectric thin films](https://scholariq.org/papers/wake-up-effects-in-si-doped-hafnium-oxide-ferroelectric-thin-films/)
- [A 10nm high performance and low-power CMOS technology featuring 3rd generation FinFET transistors, Self-Aligned Quad Patterning, contact over active gate and cobalt local interconnects](https://scholariq.org/papers/a-10nm-high-performance-and-low-power-cmos-technology-featuring-3-sup-rd-sup/)
- [Design and Performance Evaluation of Overcurrent Protection Schemes for Silicon Carbide (SiC) Power MOSFETs](https://scholariq.org/papers/design-and-performance-evaluation-of-overcurrent-protection-schemes-for-silicon/)
- [Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)](https://scholariq.org/papers/sub-10-nm-electron-beam-lithography-using-cold-development-of-poly/)
- [Switching Kinetic of VCM‐Based Memristor: Evolution and Positioning of Nanofilament](https://scholariq.org/papers/switching-kinetic-of-vcm-based-memristor-evolution-and-positioning-of/)
- [Breaking the symmetry of single-atom catalysts enables an extremely low energy barrier and high stability for large-current-density water splitting](https://scholariq.org/papers/breaking-the-symmetry-of-single-atom-catalysts-enables-an-extremely-low-energy/)
- [Mechanisms and reactions during atomic layer deposition on polymers](https://scholariq.org/papers/mechanisms-and-reactions-during-atomic-layer-deposition-on-polymers/)
- [Influence of microstructure on the cutting behaviour of silicon](https://scholariq.org/papers/influence-of-microstructure-on-the-cutting-behaviour-of-silicon/)
- [Characterisation of Ti1−xSixNy nanocomposite films](https://scholariq.org/papers/characterisation-of-ti1-xsixny-nanocomposite-films/)
- [Tailoring Porous Silicon for Biomedical Applications: From Drug Delivery to Cancer Immunotherapy](https://scholariq.org/papers/tailoring-porous-silicon-for-biomedical-applications-from-drug-delivery-to/)
- [A 90 nm 1.8 V 512 Mb Diode-Switch PRAM With 266 MB/s Read Throughput](https://scholariq.org/papers/a-90-nm-1-8-v-512-mb-diode-switch-pram-with-266-mb-s-read-throughput/)
- [Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion](https://scholariq.org/papers/aluminum-oxide-from-trimethylaluminum-and-water-by-atomic-layer-deposition-the/)
## Topic primary papers
Showing 15 of 20.
- [Pinpoint and bulk electrochemical reduction of insulating silicon dioxide to silicon](https://scholariq.org/papers/pinpoint-and-bulk-electrochemical-reduction-of-insulating-silicon-dioxide-to/)
- [Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)](https://scholariq.org/papers/sub-10-nm-electron-beam-lithography-using-cold-development-of-poly/)
- [Mechanisms and reactions during atomic layer deposition on polymers](https://scholariq.org/papers/mechanisms-and-reactions-during-atomic-layer-deposition-on-polymers/)
- [Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion](https://scholariq.org/papers/aluminum-oxide-from-trimethylaluminum-and-water-by-atomic-layer-deposition-the/)
- [An XPS study of Au alloyed Al–O sputtered coatings](https://scholariq.org/papers/an-xps-study-of-au-alloyed-al-o-sputtered-coatings/)
- [Temperature-Dependent Subsurface Growth during Atomic Layer Deposition on Polypropylene and Cellulose Fibers](https://scholariq.org/papers/temperature-dependent-subsurface-growth-during-atomic-layer-deposition-on/)
- [Study of electrical and microstructure properties of high dielectric hafnium oxide thin film for MOS devices](https://scholariq.org/papers/study-of-electrical-and-microstructure-properties-of-high-dielectric-hafnium/)
- [Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors](https://scholariq.org/papers/thermal-and-plasma-enhanced-atomic-layer-deposition-of-sio2-using-commercial/)
- [Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties](https://scholariq.org/papers/aluminum-oxide-titanium-dioxide-nanolaminates-grown-by-atomic-layer-deposition/)
- [Mechanical assessment of suspended ALD thin films by bulge and shaft-loading techniques](https://scholariq.org/papers/mechanical-assessment-of-suspended-ald-thin-films-by-bulge-and-shaft-loading/)
- [X-ray diffraction evidence for epitaxial microcrystallinity in thermally oxidized SiO2thin films on the Si(001) surface](https://scholariq.org/papers/x-ray-diffraction-evidence-for-epitaxial-microcrystallinity-in-thermally/)
- [Controlled Fabrication of Multiwall Anatase TiO2 Nanotubular Architectures](https://scholariq.org/papers/controlled-fabrication-of-multiwall-anatase-tio-sub-2-sub-nanotubular/)
- [Gamma-ray-irradiation effects on the leakage current and reliability of sputtered TiO2 gate oxide in metal–oxide–semiconductor capacitors](https://scholariq.org/papers/gamma-ray-irradiation-effects-on-the-leakage-current-and-reliability-of/)
- [Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon](https://scholariq.org/papers/microscratch-testing-method-for-systematic-evaluation-of-the-adhesion-of-atomic/)
- [Formation and Properties of Cubic Boron Nitride Films on Tungsten Carbide by Plasma Chemical Vapor Deposition](https://scholariq.org/papers/formation-and-properties-of-cubic-boron-nitride-films-on-tungsten-carbide-by/)
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Source: ScholarIQ — public research metadata, principally OpenAlex. See https://scholariq.org/sources/ for provenance and https://scholariq.org/methodology/ for what these figures mean.