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Controlled chemical etching leads to efficient silicon–bismuth interface for photoelectrochemical CO2 reduction to formate

PaperCitations, authors & open-access status

Controlled chemical etching leads to efficient silicon–bismuth interface for photoelectrochemical CO2 reduction to formate is a paper indexed in ScholarIQ from OpenAlex. ScholarIQ records 41 citations, 2018 year and closed oa status.

41
Citations
2018
Year
closed
OA Status

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N. Han
Author
CO2 Reduction Techniques and Catalysts
Topic
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Topic
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Topic
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