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極薄膜NO Oxynitrideゲート絶縁膜とNi SALICIDEプロセスを用いた高性能35nmゲート長CMOS
PaperCitations, authors & open-access status
極薄膜NO Oxynitrideゲート絶縁膜とNi SALICIDEプロセスを用いた高性能35nmゲート長CMOS is a paper indexed in ScholarIQ from OpenAlex. ScholarIQ records 0 citations, 2002 year and closed oa status.
0
Citations
2002
Year
closed
OA Status