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Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering

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Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering is a paper indexed in ScholarIQ from OpenAlex.

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ScholarIQcitation count

Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering has 70 citations in the OpenAlex counts ScholarIQ stores.

When was Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering published?

ScholarIQyear

Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering has 2005 year in the ScholarIQ index.

What is the open-access status of Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering?

ScholarIQoa status

Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering has closed oa status in the ScholarIQ index.

What is the DOI of Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering?

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The DOI for Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering is on the source record.

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The OpenAlex for Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering is on the source record.

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