Copper Interconnects and Reliability
Copper Interconnects and Reliability is a topic indexed in ScholarIQ from OpenAlex.
What is known about Copper Interconnects and Reliability?
This cluster of papers focuses on the development and characterization of low dielectric constant (low-k) materials for microelectronics, with an emphasis on their application in copper metallization and interconnect scaling. The papers cover topics such as electromigration, thin films, plasma processing, diffusion barriers, and the electrical resistivity of nanowires.
How many works does Copper Interconnects and Reliability have?
Copper Interconnects and Reliability has 39,509 works in the ScholarIQ index. The count is the OpenAlex total, not the number of papers listed on this page.
How many citations does Copper Interconnects and Reliability have?
Copper Interconnects and Reliability has 343,787 citations in the OpenAlex counts ScholarIQ stores.
What is the OpenAlex record for Copper Interconnects and Reliability?
The OpenAlex for Copper Interconnects and Reliability is on the source record.