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Technostress in Professional Settings

TopicLeading institutions, researchers & key papers

Technostress in Professional Settings is a topic indexed in ScholarIQ from OpenAlex.

What is known about Technostress in Professional Settings?

ScholarIQrecord summary

This cluster of papers explores the impact of technostress, induced by the use of technology in the workplace, on employee well-being, job performance, and productivity. It delves into the causes, consequences, coping strategies, and implications of technostress in various professional settings.

How many works does Technostress in Professional Settings have?

ScholarIQindexed works

Technostress in Professional Settings has 12,792 works in the ScholarIQ index. The count is the OpenAlex total, not the number of papers listed on this page.

How many citations does Technostress in Professional Settings have?

ScholarIQcitation count

Technostress in Professional Settings has 71,407 citations in the OpenAlex counts ScholarIQ stores.

What is the OpenAlex record for Technostress in Professional Settings?

ScholarIQopenalex

The OpenAlex for Technostress in Professional Settings is on the source record.

Who are the most-cited researchers behind Technostress in Professional Settings?

ScholarIQtop researchers by citations
1
Francesco Saverio Violante · Musculoskeletal pain and rehabilitation
413 works177,727 citations
2
Wilmar B. Schaufeli · Workplace Health and Well-being
770 works155,930 citations
3
Jinsong Huang · Perovskite Materials and Applications
493 works82,542 citations
4
Cary L. Cooper · Workplace Health and Well-being
1,885 works70,631 citations
5
Natalie J. Allen · Job Satisfaction and Organizational Behavior
146 works50,716 citations

Where is Technostress in Professional Settings research published, and who funds it?

ScholarIQvenues & funding sources

TOP JOURNALS

No journal data available yet.

TOP FUNDERS

National Science Foundation—
NIH—
Wellcome Trust—
European Research Council—
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