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Field emission of nanostructured amorphous SiCN films deposited by reactive magnetron sputtering of SiC in CH4/N2 atmosphere

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Field emission of nanostructured amorphous SiCN films deposited by reactive magnetron sputtering of SiC in CH4/N2 atmosphere is a paper indexed in ScholarIQ from OpenAlex.

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ScholarIQcitation count

Field emission of nanostructured amorphous SiCN films deposited by reactive magnetron sputtering of SiC in CH4/N2 atmosphere has 25 citations in the OpenAlex counts ScholarIQ stores.

When was Field emission of nanostructured amorphous SiCN films deposited by reactive magnetron sputtering of SiC in CH4/N2 atmosphere published?

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Field emission of nanostructured amorphous SiCN films deposited by reactive magnetron sputtering of SiC in CH4/N2 atmosphere has 2002 year in the ScholarIQ index.

What is the open-access status of Field emission of nanostructured amorphous SiCN films deposited by reactive magnetron sputtering of SiC in CH4/N2 atmosphere?

ScholarIQoa status

Field emission of nanostructured amorphous SiCN films deposited by reactive magnetron sputtering of SiC in CH4/N2 atmosphere has closed oa status in the ScholarIQ index.

What is the DOI of Field emission of nanostructured amorphous SiCN films deposited by reactive magnetron sputtering of SiC in CH4/N2 atmosphere?

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The DOI for Field emission of nanostructured amorphous SiCN films deposited by reactive magnetron sputtering of SiC in CH4/N2 atmosphere is on the source record.

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The OpenAlex for Field emission of nanostructured amorphous SiCN films deposited by reactive magnetron sputtering of SiC in CH4/N2 atmosphere is on the source record.

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