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Influence of Colloidal Abrasive Size on Material Removal Rate and Surface Finish in SiO<sub>2</sub>Chemical Mechanical Polishing
PaperCitations, authors & open-access status
Influence of Colloidal Abrasive Size on Material Removal Rate and Surface Finish in SiO<sub>2</sub>Chemical Mechanical Polishing is a paper indexed in ScholarIQ from OpenAlex. ScholarIQ records 93 citations, 2002 year and closed oa status.
93
Citations
2002
Year
closed
OA Status