Large Pre-Trained Models and Few-Shot Fine-Tuning for Virtual Metrology: A Framework for Uncertainty-Driven Adaptive Process Control in Semiconductor Manufacturing

Large Pre-Trained Models and Few-Shot Fine-Tuning for Virtual Metrology: A Framework for Uncertainty-Driven Adaptive Process Control in Semiconductor Manufacturing is a paper indexed in ScholarIQ from OpenAlex. ScholarIQ records 4 citations, 2025 year and closed oa status.