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Reduction of pattern peeling in step-and-flash imprint lithography

PaperCitations, authors & open-access status

Reduction of pattern peeling in step-and-flash imprint lithography is a paper indexed in ScholarIQ from OpenAlex. ScholarIQ records 28 citations, 2013 year and closed oa status.

28
Citations
2013
Year
closed
OA Status

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