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Advancements in Photolithography Techniques

TopicLeading institutions, researchers & key papers

Advancements in Photolithography Techniques is a topic indexed in ScholarIQ from OpenAlex.

What is known about Advancements in Photolithography Techniques?

ScholarIQrecord summary

This cluster of papers focuses on electron beam lithography, nanofabrication, and resolution limits in lithography techniques. It explores the applications of extreme ultraviolet lithography, chemically amplified resists, and high-resolution patterning materials. The cluster also discusses the challenges related to line edge roughness and mask design in nanolithography.

How many works does Advancements in Photolithography Techniques have?

ScholarIQindexed works

Advancements in Photolithography Techniques has 15 works in the ScholarIQ index. The count is the OpenAlex total, not the number of papers listed on this page.

What is the OpenAlex record for Advancements in Photolithography Techniques?

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The OpenAlex for Advancements in Photolithography Techniques is on the source record.

What are the most-cited papers on Advancements in Photolithography Techniques?

ScholarIQmost cited works
EUV lithography performance for manufacturing: status and outlook
Alberto Pirati, Rudy Peeters, Daniel Smith, Sjoerd Lok, Martijn van Noordenburg, Roderik van Es, Eric Verhoeven, H.C. Meijer, Arthur Minnaert, Jan-Willem van der Horst, H. Meiling, Joerg Mallmann, Christian Wagner, Judon Stoeldraijer, Geert Fisser, Jo Finders, Carmen Zoldesi, Uwe Stamm, H.B.K. Boom, David C. Brandt, Daniel J. Brown, Igor V. Fomenkov, Michael Purvis
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 201690 Citations
EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update
Mark van de Kerkhof, Arthur Minnaert, Marco Pieters, H. Meiling, Joost Smits, Rudy Peeters, Roderik van Es, Geert Fisser, Jos W. de Klerk, Roel Moors, Eric Verhoeven, Leon Levasier
201844 Citations
Optimization of optical proximity correction to reduce mask write time using genetic algorithm
Gregory J. Dick, Abhishek Asthana, Liang Cao, Jing Cheng, David Power
20181 Citations

Where is Advancements in Photolithography Techniques research published, and who funds it?

ScholarIQvenues & funding sources

TOP FUNDERS

National Science Foundation—
NIH—
Wellcome Trust—
European Research Council—
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How much of the research on Advancements in Photolithography Techniques is open access?

ScholarIQopen access share
0%OPEN ACCESS
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0%
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0%
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0%
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0%
Closed
100%

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