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Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
PaperCitations, authors & open-access status
Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors is a paper indexed in ScholarIQ from OpenAlex. ScholarIQ records 78 citations, 2014 year and closed oa status.
78
Citations
2014
Year
closed
OA Status