Ferroelectric and Negative Capacitance Devices

This cluster of papers focuses on the development and application of ferroelectric devices, particularly in the context of low-power nanoscale applications. The research covers topics such as ferroelectricity in hafnium oxide thin films, negative capacitance in ferroelectric capacitors, doping effects on ferroelectric properties, and the use of ferroelectric field-effect transistors for memory and computing applications.

How has Ferroelectric and Negative Capacitance Devices's publication output changed over time?

Output grew0% over the shown period — from 1 works in 2004 to 1 in 2023.

What are the most-cited papers on Ferroelectric and Negative Capacitance Devices?

Where is Ferroelectric and Negative Capacitance Devices research published, and who funds it?

How much of the research on Ferroelectric and Negative Capacitance Devices is open access?