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Characterization of low dielectric constant plasma enhanced chemical vapor deposition fluorinated silicon oxide films as intermetal dielectric materials
PaperCitations, authors & open-access status
Characterization of low dielectric constant plasma enhanced chemical vapor deposition fluorinated silicon oxide films as intermetal dielectric materials is a paper indexed in ScholarIQ from OpenAlex. ScholarIQ records 25 citations, 1998 year and closed oa status.
25
Citations
1998
Year
closed
OA Status