On this page:OverviewPublicationsResearchersKey papersJournalsOpen accessInstitutions
ScholarIQanswers from OpenAlex

Copper Interconnects and Reliability

TopicLeading institutions, researchers & key papers

Copper Interconnects and Reliability is a topic indexed in ScholarIQ from OpenAlex.

What is known about Copper Interconnects and Reliability?

ScholarIQrecord summary

This cluster of papers focuses on the development and characterization of low dielectric constant (low-k) materials for microelectronics, with an emphasis on their application in copper metallization and interconnect scaling. The papers cover topics such as electromigration, thin films, plasma processing, diffusion barriers, and the electrical resistivity of nanowires.

How many works does Copper Interconnects and Reliability have?

ScholarIQindexed works

Copper Interconnects and Reliability has 11 works in the ScholarIQ index. The count is the OpenAlex total, not the number of papers listed on this page.

What is the OpenAlex record for Copper Interconnects and Reliability?

ScholarIQopenalex

The OpenAlex for Copper Interconnects and Reliability is on the source record.

What are the most-cited papers on Copper Interconnects and Reliability?

ScholarIQmost cited works
Behavior of aluminum oxide, intermetallics and voids in Cu–Al wire bonds
Huining Xu, C. Liu, Vadim V. Silberschmidt, Stevin S. Pramana, Timothy J. White, Zhong Chen, Viola L. Acoff
Acta Materialia. 2011247 Citations
Characterization of low dielectric constant plasma enhanced chemical vapor deposition fluorinated silicon oxide films as intermetal dielectric materials
Kwangtaek Kim, Dae‐Hyuk Kwon, G. Nallapati, G. S. Lee
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 199825 Citations
Dry etch challenges for CD shrinkage in memory process
T. Matsushita, Takanori Matsumoto, Hidefumi Mukai, Suigen Kyoh, Kohji Hashimoto
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 20156 Citations
Ascorbic Acid-Assisted Self-Assembly of 4-Aminothiophenol to Enhance Interfacial Adhesion between Copper and Ajinomoto Build-up Film
Xindi Xu, Chi Zhang, Wei-Yi Zhang, Yang Chao, MA Xian-yin, Yuanrong Cheng, Tianwen Jiang, Wen-Bin Cai
Langmuir. 20260 Citations

Where is Copper Interconnects and Reliability research published, and who funds it?

ScholarIQvenues & funding sources

TOP FUNDERS

National Science Foundation—
NIH—
Wellcome Trust—
European Research Council—
Funder breakdown is a member featureSign up free to unlock

How much of the research on Copper Interconnects and Reliability is open access?

ScholarIQopen access share
0%OPEN ACCESS
Gold
0%
Green
0%
Hybrid
0%
Bronze
0%
Closed
100%

Related on ScholarIQ

470M+ articles · 14-day free trial