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Influence of positive bias stress on N2O plasma improved InGaZnO thin film transistor
PaperCitations, authors & open-access status
Influence of positive bias stress on N2O plasma improved InGaZnO thin film transistor is a paper indexed in ScholarIQ from OpenAlex. ScholarIQ records 171 citations, 2010 year and closed oa status.
171
Citations
2010
Year
closed
OA Status