Study of electrical and microstructure properties of high dielectric hafnium oxide thin film for MOS devices
Study of electrical and microstructure properties of high dielectric hafnium oxide thin film for MOS devices is a paper indexed in ScholarIQ from OpenAlex.
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Study of electrical and microstructure properties of high dielectric hafnium oxide thin film for MOS devices has 79 citations in the OpenAlex counts ScholarIQ stores.
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Study of electrical and microstructure properties of high dielectric hafnium oxide thin film for MOS devices has 2007 year in the ScholarIQ index.
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