Scholar IQ
Try ScholarIQ free
Upload Records Snowball Search Search OpenAlex
About the database
ScholarIQanswers from OpenAlex

Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)

PaperCitations, authors & open-access status

Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) is a paper indexed in ScholarIQ from OpenAlex. ScholarIQ records 240 citations, 2004 year and closed oa status.

240
Citations
2004
Year
closed
OA Status

Related on ScholarIQ

Walter Hu
Author
Semiconductor materials and devices
Topic
Semiconductor materials and devices
Topic
Advancements in Photolithography Techniques
Topic
Integrated Circuits and Semiconductor Failure Analysis
Topic
470M+ articles · free account