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Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)

PaperCitations, authors & open-access status

Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) is a paper indexed in ScholarIQ from OpenAlex.

How many citations does Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) have?

ScholarIQcitation count

Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) has 240 citations in the OpenAlex counts ScholarIQ stores.

When was Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) published?

ScholarIQyear

Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) has 2004 year in the ScholarIQ index.

What is the open-access status of Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)?

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Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) has closed oa status in the ScholarIQ index.

What is the DOI of Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)?

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The DOI for Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) is on the source record.

What is the OpenAlex record for Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)?

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The OpenAlex for Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) is on the source record.

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