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Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)
PaperCitations, authors & open-access status
Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) is a paper indexed in ScholarIQ from OpenAlex. ScholarIQ records 240 citations, 2004 year and closed oa status.
240
Citations
2004
Year
closed
OA Status