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Takeuchiプロットを用いたHigh-k/Metal-Gate MOSFETのばらつき評価(低電圧/低消費電力技術,新デバイス・回路とその応用)
PaperCitations, authors & open-access status
Takeuchiプロットを用いたHigh-k/Metal-Gate MOSFETのばらつき評価(低電圧/低消費電力技術,新デバイス・回路とその応用) is a paper indexed in ScholarIQ from OpenAlex. ScholarIQ records 0 citations, 2011 year and closed oa status.
0
Citations
2011
Year
closed
OA Status
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