ScholarIQanswers from OpenAlex
Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process
PaperCitations, authors & open-access status
Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process is a paper indexed in ScholarIQ from OpenAlex.
How many citations does Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process have?
ScholarIQcitation count
Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process has 15 citations in the OpenAlex counts ScholarIQ stores.
When was Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process published?
ScholarIQyear
Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process has 2005 year in the ScholarIQ index.
What is the open-access status of Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process?
ScholarIQoa status
Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process has bronze oa status in the ScholarIQ index.
What is the DOI of Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process?
ScholarIQdoi
The DOI for Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process is on the source record.
What is the OpenAlex record for Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process?
ScholarIQopenalex
The OpenAlex for Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process is on the source record.