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Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process
PaperCitations, authors & open-access status
Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process is a paper indexed in ScholarIQ from OpenAlex. ScholarIQ records 15 citations, 2005 year and bronze oa status.
15
Citations
2005
Year
bronze
OA Status